LI Qianqian^1,2, YIN Guilin², ZHENG Cihang¹, YU Zhen¹, HE Dannong^1,2*

(1. College of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200240, China 2. National Engineering Research Center of Nanotechnology, Shanghai 200241, China)

Abstract: MoS_x-TiN composite films were prepared by magnetron reaction-sputtering. The effect of small amount of TiN on the microstructure and performance of MoS₂ -based film was studied. The structure and properties of films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and UMT-2 multi-functional tribometer. Experimental results indicated that, compared with pure MoS₂ film, MoS_x-TiN composite film had a stronger preferential orientation of crystal plane (002) and a compact microstructure. The MoS_x-TiN composite film exhibited better tribological properties than that of pure MoS₂ and MoS₂-Ti films in humid air at room temperature.

Key words: MoS₂; TiN; magnetron reaction-sputtering; tribological property;

E-mail: hdnbill@yahoo.cn

Tribology, Vol. 31, Issue 1, 2011, 40~44